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Стандарт и/или проект находящийся в компетенции ISO/TC 201/SC 6 Секретариата Этап ICS
ISO 12406:2010
Surface chemical analysis -- Secondary-ion mass spectrometry -- Method for depth profiling of arsenic in silicon
90.93
ISO 13084:2011 [Withdrawn]
Surface chemical analysis -- Secondary-ion mass spectrometry -- Calibration of the mass scale for a time-of-flight secondary-ion mass spectrometer
95.99
ISO 13084:2018
Surface chemical analysis -- Secondary ion mass spectrometry -- Calibration of the mass scale for a time-of-flight secondary ion mass spectrometer
60.60
ISO 14237:2000 [Withdrawn]
Surface chemical analysis -- Secondary-ion mass spectrometry -- Determination of boron atomic concentration in silicon using uniformly doped materials
95.99
ISO 14237:2010
Surface chemical analysis -- Secondary-ion mass spectrometry -- Determination of boron atomic concentration in silicon using uniformly doped materials
90.93
ISO 17560:2002 [Withdrawn]
Surface chemical analysis -- Secondary-ion mass spectrometry -- Method for depth profiling of boron in silicon
95.99
ISO 17560:2014
Surface chemical analysis -- Secondary-ion mass spectrometry -- Method for depth profiling of boron in silicon
60.60
ISO 17862:2013
Surface chemical analysis -- Secondary ion mass spectrometry -- Linearity of intensity scale in single ion counting time-of-flight mass analysers
90.60
ISO 18114:2003
Surface chemical analysis -- Secondary-ion mass spectrometry -- Determination of relative sensitivity factors from ion-implanted reference materials
90.20
ISO 20341:2003
Surface chemical analysis -- Secondary-ion mass spectrometry -- Method for estimating depth resolution parameters with multiple delta-layer reference materials
90.20
ISO 20411:2018
Surface chemical analysis -- Secondary ion mass spectrometry -- Correction method for saturated intensity in single ion counting dynamic secondary ion mass spectrometry
60.60
ISO 22415:2019
Surface chemical analysis -- Secondary ion mass spectrometry -- Method for determining yield volume in argon cluster sputter depth profiling of organic materials
60.60
ISO/WD 22933 [Under development]
Surface chemical analysis-Secondary ion mass spectrometry- Method for the measurement of mass resolution in SIMS
20.20
ISO 23812:2009
Surface chemical analysis -- Secondary-ion mass spectrometry -- Method for depth calibration for silicon using multiple delta-layer reference materials
90.93
ISO 23830:2008
Surface chemical analysis -- Secondary-ion mass spectrometry -- Repeatability and constancy of the relative-intensity scale in static secondary-ion mass spectrometry
90.93

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