Abstract
This document specifies the technical requirements for TiAlSiN thin films deposited by magnetron sputtering.
General information
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Status: Under developmentPublication date: 2026-07Stage: Proof sent to secretariat or FDIS ballot initiated: 8 weeks [50.20]
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Edition: 1Number of pages: 6
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Technical Committee :ISO/TC 107/SC 9ICS :25.220.40
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