Abstract Preview

ISO 17331:2004 specifies chemical methods for the collection of iron and/or nickel from the surface of silicon-wafer working reference materials by the vapour-phase decomposition method or the direct acid droplet decomposition method.

It applies to iron and/or nickel atomic surface densities from 6 times 10 to the power 9 atoms per square centimetre to 5 times 10 to the power 11 atoms per square centimetre.


General information

  • Status :  Published
    Publication date : 2004-05
  • Edition : 1
    Number of pages : 18
  • :
    ISO/TC 201
    Surface chemical analysis
  • 71.040.40
    Chemical analysis

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