• Фильтр:

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Стандарт и/или проект находящийся в компетенции ISO/TC 201/SC 4 Секретариата Этап ICS
ISO 14606:2000
Surface chemical analysis -- Sputter depth profiling -- Optimization using layered systems as reference materials
95.99
ISO 14606:2015
Surface chemical analysis -- Sputter depth profiling -- Optimization using layered systems as reference materials
60.60
ISO/TR 15969:2001
Surface chemical analysis -- Depth profiling -- Measurement of sputtered depth
90.93
ISO 16531:2013
Surface chemical analysis -- Depth profiling -- Methods for ion beam alignment and the associated measurement of current or current density for depth profiling in AES and XPS
90.92
ISO/CD 16531
Surface chemical analysis -- Depth profiling -- Methods for ion beam alignment and the associated measurement of current or current density for depth profiling in AES and XPS
30.99
ISO 17109:2015
Surface chemical analysis -- Depth profiling -- Method for sputter rate determination in X-ray photoelectron spectroscopy, Auger electron spectroscopy and secondary-ion mass spectrometry sputter depth profiling using single and multi-layer thin films
60.60
ISO/TR 22335:2007
Surface chemical analysis -- Depth profiling -- Measurement of sputtering rate: mesh-replica method using a mechanical stylus profilometer
90.93

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