Informations

• Président(e):

  vacant
• Responsable de programmes techniques ISO [TPM]:

  M Stéphane SAUVAGE
  Responsable éditorial ISO [EM]:

  Ms Lucy Kirk
• Date de création: 2026

Domaine des travaux

Standardization of the chemical vapor deposition (CVD) and atomic layer deposition (ALD) processes, including their variants, combinations, and control parameters to ensure process stability and reproducibility. This includes the specification of metallic, ceramic, and inorganic nanocomposite coatings - including multilayer and multiphase systems - for protective, decorative, and functional applications. Standardization of the testing and inspection methods, substrate requirements, and pretreatment procedures for such coatings.