Sobre

• Secretaría: SAC (China)
  Responsable de comité:

  Mr Hui Chen
• Presidente/a:

  vacante
• Responsable de programa técnico de ISO [TPM]:

  Mr Stéphane Sauvage
  Responsable editorial de ISO [EM]:

  Ms Lucy Kirk
• Fecha de creación: 2026

Alcance

Standardization of the chemical vapor deposition (CVD) and atomic layer deposition (ALD) processes, including their variants, combinations, and control parameters to ensure process stability and reproducibility. This includes the specification of metallic, ceramic, and inorganic nanocomposite coatings - including multilayer and multiphase systems - for protective, decorative, and functional applications. Standardization of the testing and inspection methods, substrate requirements, and pretreatment procedures for such coatings.