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Abstract Preview

ISO 14237:2010 specifies a secondary-ion mass spectrometric method for the determination of boron atomic concentration in single-crystalline silicon using uniformly doped materials calibrated by a certified reference material implanted with boron. This method is applicable to uniformly doped boron in the concentration range from 1 x 1016 atoms/cm3 to 1 x 1020 atoms/cm3.


General information

  • Status :  Published
    Publication date : 2010-07
  • Edition : 2
    Number of pages : 19
  • Technical Committee
    :
    ISO/TC 201/SC 6
    Secondary ion mass spectrometry
  • ICS :
    71.040.40
    Chemical analysis

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