This standard was last reviewed and confirmed in 2016. Therefore this version remains current.
Abstract Preview
ISO 14237:2010 specifies a secondary-ion mass spectrometric method for the determination of boron atomic concentration in single-crystalline silicon using uniformly doped materials calibrated by a certified reference material implanted with boron. This method is applicable to uniformly doped boron in the concentration range from 1 x 1016 atoms/cm3 to 1 x 1020 atoms/cm3.
General information
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Status : PublishedPublication date : 2010-07
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Edition : 2Number of pages : 19
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- ICS :
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Chemical analysis
Buy this standard
| Format | Language | |
|---|---|---|
| Paper |
- CHF118
Life cycle
A standard is reviewed every 5 years
Revisions / Corrigenda
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Previously
ISO 14237:2000
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Now confirmed
ISO 14237:2010
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