This document specifies the test method for measuring the crystalline quality of single-crystal thin film (wafer) using the XRD method with parallel X-ray beam. This document is applicable to all of the single-crystal thin film (wafer) as bulk or epitaxial layer structure.
Status: PublishedPublication date: 2020-08
Edition: 1Number of pages: 29
Technical Committee: ISO/TC 206 Fine ceramics
- ICS :
- 81.060.30 Advanced ceramics
This standard contributes to the following Sustainable Development Goal:
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ISO 22278:2020Stage: 60.60
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