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Abstract Preview

ISO 14606:2015 gives guidance on the optimization of sputter-depth profiling parameters using appropriate single-layered and multilayered reference materials in order to achieve optimum depth resolution as a function of instrument settings in Auger electron spectroscopy, X-ray photoelectron spectroscopy and secondary ion mass spectrometry.

ISO 14606:2015 is not intended to cover the use of special multilayered systems such as delta doped layers.


General information

  • Status :  Published
    Publication date : 2015-12
  • Edition : 2
    Number of pages : 16
  • Technical Committee
    :
    ISO/TC 201/SC 4
    Depth profiling
  • ICS :
    71.040.40
    Chemical analysis

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This standard contributes to the following Sustainable Development Goal:

9
Industry, Innovation and Infrastructure

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