Standards catalogue

71.040.40 - Chemical analysis Including analysis of gases and surface chemical analysis

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Standard and/or project Stage TC
ISO Guide 18:1978 [Withdrawn]
Layout for a standard method of chemical analysis
95.99 ISO/TMBG
ISO/R 78:1969 [Withdrawn]
Guide on the form for standards for chemical products and for methods of chemical analysis
95.99 ISO/TC 47
ISO 78-2:1982 [Withdrawn]
Layouts for standards -- Part 2: Standard for chemical analysis
95.99 ISO/TC 47
ISO 78-2:1999
Chemistry -- Layouts for standards -- Part 2: Methods of chemical analysis
90.93 ISO/TC 47
ISO 758:1976
Liquid chemical products for industrial use -- Determination of density at 20 degrees C
90.93 ISO/TC 47
ISO 759:1981
Volatile organic liquids for industrial use -- Determination of dry residue after evaporation on water bath -- General method
90.93 ISO/TC 47
ISO 760:1978
Determination of water -- Karl Fischer method (General method)
90.93 ISO/TC 47
ISO 918:1983
Volatile organic liquids for industrial use -- Determination of distillation characteristics
90.93 ISO/TC 47
ISO 2590:1973 [Withdrawn]
General method for the determination of arsenic -- Silver diethyldithiocarbamate photometric method
95.99 ISO/TC 47
ISO 2718:1974 [Withdrawn]
Standard layout for a method of chemical analysis by gas chromatography
95.99 ISO/TC 47
ISO 3165:1976
Sampling of chemical products for industrial use -- Safety in sampling
90.93 ISO/TC 47
ISO 5790:1979 [Withdrawn]
Inorganic chemical products for industrial use -- General method for determination of chloride content -- Mercurimetric method
95.99 ISO/TC 47
ISO 6141:1979 [Withdrawn]
Gas analysis -- Calibration gas mixtures -- Certificate of mixture preparation
95.99 ISO/TC 158
ISO 6141:1984 [Withdrawn]
Gas analysis -- Calibration gas mixtures -- Certificate of mixture preparation
95.99 ISO/TC 158
ISO 6141:2000 [Withdrawn]
Gas analysis -- Requirements for certificates for calibration gases and gas mixtures
95.99 ISO/TC 158
ISO 6141:2015
Gas analysis -- Contents of certificates for calibration gas mixtures
60.60 ISO/TC 158
ISO 6141:2015/DAmd 1 [Under development]
40.99 ISO/TC 158
ISO 6142:1981 [Withdrawn]
Gas analysis -- Preparation of calibration gas mixtures -- Weighing methods
95.99 ISO/TC 158
95.99 ISO/TC 158
ISO 6142:2001 [Withdrawn]
Gas analysis -- Preparation of calibration gas mixtures -- Gravimetric method
95.99 ISO/TC 158
ISO 6142:2001/Amd 1:2009 [Withdrawn]
Liquid introduction
95.99 ISO/TC 158
ISO 6142-1:2015
Gas analysis -- Preparation of calibration gas mixtures -- Part 1: Gravimetric method for Class I mixtures
60.60 ISO/TC 158
ISO 6143:1981 [Withdrawn]
Gas analysis -- Determination of composition of calibration gas mixtures -- Comparison methods
95.99 ISO/TC 158
ISO 6143:2001
Gas analysis -- Comparison methods for determining and checking the composition of calibration gas mixtures
90.93 ISO/TC 158
ISO 6144:1981 [Withdrawn]
Gas analysis -- Preparation of calibration gas mixtures -- Static volumetric methods
95.99 ISO/TC 158
ISO 6144:2003
Gas analysis -- Preparation of calibration gas mixtures -- Static volumetric method
90.20 ISO/TC 158
ISO 6145-1:1986 [Withdrawn]
Gas analysis -- Preparation of calibration gas mixtures -- Dynamic volumetric methods -- Part 1: Methods of calibration
95.99 ISO/TC 158
ISO 6145-1:2003
Gas analysis -- Preparation of calibration gas mixtures using dynamic volumetric methods -- Part 1: Methods of calibration
90.92 ISO/TC 158
ISO/DIS 6145-1 [Under development]
Gas analysis -- Preparation of calibration gas mixtures using dynamic methods -- Part 1: General aspects
40.99 ISO/TC 158
ISO 6145-2:2001 [Withdrawn]
Gas analysis -- Preparation of calibration gas mixtures using dynamic volumetric methods -- Part 2: Volumetric pumps
95.99 ISO/TC 158
ISO 6145-2:2014
Gas analysis -- Preparation of calibration gas mixtures using dynamic methods -- Part 2: Piston pumps
60.60 ISO/TC 158
ISO 6145-3:1986 [Withdrawn]
Gas analysis -- Preparation of calibration gas mixtures -- Dynamic volumetric methods -- Part 3: Periodic injections into a flowing gas stream
95.99 ISO/TC 158
ISO 6145-4:1986 [Withdrawn]
Gas analysis -- Preparation of calibration gas mixtures -- Dynamic volumetric methods -- Part 4: Continuous injection method
95.99 ISO/TC 158
ISO 6145-4:2004
Gas analysis -- Preparation of calibration gas mixtures using dynamic volumetric methods -- Part 4: Continuous syringe injection method
90.93 ISO/TC 158
ISO 6145-5:2001 [Withdrawn]
Gas analysis -- Preparation of calibration gas mixtures using dynamic volumetric methods -- Part 5: Capillary calibration devices
95.99 ISO/TC 158
ISO 6145-5:2009
Gas analysis -- Preparation of calibration gas mixtures using dynamic volumetric methods -- Part 5: Capillary calibration devices
90.93 ISO/TC 158
ISO 6145-6:1986 [Withdrawn]
Gas analysis -- Preparation of calibration gas mixtures -- Dynamic volumetric methods -- Part 6: Sonic orifices
95.99 ISO/TC 158
ISO 6145-6:2003 [Withdrawn]
Gas analysis -- Preparation of calibration gas mixtures using dynamic volumetric methods -- Part 6: Critical orifices
95.99 ISO/TC 158
ISO 6145-6:2017
Gas analysis -- Preparation of calibration gas mixtures using dynamic methods -- Part 6: Critical flow orifices
60.60 ISO/TC 158
ISO 6145-7:2001 [Withdrawn]
Gas analysis -- Preparation of calibration gas mixtures using dynamic volumetric methods -- Part 7: Thermal mass-flow controllers
95.99 ISO/TC 158
ISO 6145-7:2009 [Withdrawn]
Gas analysis -- Preparation of calibration gas mixtures using dynamic volumetric methods -- Part 7: Thermal mass-flow controllers
95.99 ISO/TC 158
ISO 6145-7:2018
Gas analysis -- Preparation of calibration gas mixtures using dynamic methods -- Part 7: Thermal mass-flow controllers
60.60 ISO/TC 158
ISO 6145-8:2005
Gas analysis -- Preparation of calibration gas mixtures using dynamic volumetric methods -- Part 8: Diffusion method
90.20 ISO/TC 158
ISO 6145-9:2001 [Withdrawn]
Gas analysis -- Preparation of calibration gas mixtures using dynamic volumetric methods -- Part 9: Saturation method
95.99 ISO/TC 158
95.99 ISO/TC 158
ISO 6145-9:2009
Gas analysis -- Preparation of calibration gas mixtures using dynamic volumetric methods -- Part 9: Saturation method
90.93 ISO/TC 158
ISO 6145-10:2002
Gas analysis -- Preparation of calibration gas mixtures using dynamic volumetric methods -- Part 10: Permeation method
90.93 ISO/TC 158
ISO 6145-11:2005
Gas analysis -- Preparation of calibration gas mixtures using dynamic volumetric methods -- Part 11: Electrochemical generation
90.20 ISO/TC 158
ISO 6146:1979 [Withdrawn]
Gas analysis -- Preparation of calibration gas mixtures -- Manometric method
95.99 ISO/TC 158
ISO 6147:1979 [Withdrawn]
Gas analysis -- Preparation of calibration gas mixtures -- Saturation method
95.99 ISO/TC 158
ISO 6206:1979
Chemical products for industrial use -- Sampling -- Vocabulary
90.93 ISO/TC 47
ISO 6227:1982
Chemical products for industrial use -- General method for determination of chloride ions -- Potentiometric method
90.93 ISO/TC 47
ISO 6228:1980
Chemical products for industrial use -- General method for determination of traces of sulphur compounds, as sulphate, by reduction and titrimetry
90.93 ISO/TC 47
ISO 6349:1979 [Withdrawn]
Gas analysis -- Preparation of calibration gas mixtures -- Permeation method
95.99 ISO/TC 158
ISO 6382:1981 [Withdrawn]
General method for determination of silicon content -- Reduced molybdosilicate spectrophotometric method
95.99 ISO/TC 47
ISO/TR 6566-1:1980 [Withdrawn]
Gas analysis -- Determination of sulphur dioxide -- Part 1: General guidance for the choice of methods
95.99 ISO/TC 158
ISO/TR 6567-1:1981 [Withdrawn]
Gas analysis -- Determination of carbon dioxide -- Part 1: General guidance for the choice of methods
95.99 ISO/TC 158
ISO 6685:1982 [Withdrawn]
Chemical products for industrial use -- General method for determination of iron content -- 1,10-Phenanthroline spectrophotometric method
95.99 ISO/TC 47
ISO 6711:1981 [Withdrawn]
Gas analysis -- Checking of calibration gas mixtures by a comparison method
95.99 ISO/TC 158
ISO 6712:1982 [Withdrawn]
Gas analysis -- Sampling and transfer equipment for gases supplying an analytical unit
95.99 ISO/TC 158
ISO 7395:1984 [Withdrawn]
Gas analysis -- Preparation of calibration gas mixtures -- Mass dynamic method
95.99 ISO/TC 158
ISO 7504:1984 [Withdrawn]
Gas analysis -- Vocabulary
95.99 ISO/TC 158
ISO 7504:2001 [Withdrawn]
Gas analysis -- Vocabulary
95.99 ISO/TC 158
ISO 7504:2015
Gas analysis -- Vocabulary
60.60 ISO/TC 158
ISO 8158:1985 [Withdrawn]
Evaluation of the performance characteristics of gas analysers
95.99 ISO/TC 158
ISO 8213:1986
Chemical products for industrial use -- Sampling techniques -- Solid chemical products in the form of particles varying from powders to coarse lumps
90.93 ISO/TC 47
ISO 10810:2010
Surface chemical analysis -- X-ray photoelectron spectroscopy -- Guidelines for analysis
90.92 ISO/TC 201/SC 7
ISO/FDIS 10810 [Under development]
Surface chemical analysis -- X-ray photoelectron spectroscopy -- Guidelines for analysis
50.00 ISO/TC 201/SC 7
ISO 11039:2012
Surface chemical analysis -- Scanning-probe microscopy -- Measurement of drift rate
90.60 ISO/TC 201/SC 9
ISO 11505:2012
Surface chemical analysis -- General procedures for quantitative compositional depth profiling by glow discharge optical emission spectrometry
90.93 ISO/TC 201/SC 8
ISO 11775:2015
Surface chemical analysis -- Scanning-probe microscopy -- Determination of cantilever normal spring constants
60.60 ISO/TC 201/SC 9
ISO 11952 [Under development]
Surface chemical analysis -- Scanning-probe microscopy -- Determination of geometric quantities using SPM: Calibration of measuring systems
60.00 ISO/TC 201/SC 9
ISO 11952:2014
Surface chemical analysis -- Scanning-probe microscopy -- Determination of geometric quantities using SPM: Calibration of measuring systems
90.92 ISO/TC 201/SC 9
ISO 12406:2010
Surface chemical analysis -- Secondary-ion mass spectrometry -- Method for depth profiling of arsenic in silicon
90.93 ISO/TC 201/SC 6
ISO 12963:2017
Gas analysis -- Comparison methods for the determination of the composition of gas mixtures based on one- and two-point calibration
60.60 ISO/TC 158
ISO 13083:2015
Surface chemical analysis -- Scanning probe microscopy -- Standards on the definition and calibration of spatial resolution of electrical scanning probe microscopes (ESPMs) such as SSRM and SCM for 2D-dopant imaging and other purposes
60.60 ISO/TC 201/SC 9
ISO 13084:2011 [Withdrawn]
Surface chemical analysis -- Secondary-ion mass spectrometry -- Calibration of the mass scale for a time-of-flight secondary-ion mass spectrometer
95.99 ISO/TC 201/SC 6
ISO 13084:2018
Surface chemical analysis -- Secondary ion mass spectrometry -- Calibration of the mass scale for a time-of-flight secondary ion mass spectrometer
60.60 ISO/TC 201/SC 6
ISO 13095:2014
Surface Chemical Analysis -- Atomic force microscopy -- Procedure for in situ characterization of AFM probe shank profile used for nanostructure measurement
60.60 ISO/TC 201/SC 9
ISO/CD TR 13096 [Under development]
Surface chemical analysis -- Scanning-probe microscopy -- Guidelines for the description of AFM probe properties
30.00 ISO/TC 201/SC 9
ISO 13424:2013
Surface chemical analysis -- X-ray photoelectron spectroscopy -- Reporting of results of thin-film analysis
90.60 ISO/TC 201/SC 7
ISO 14167:2018
Gas analysis -- General quality aspects and metrological traceability of calibration gas mixtures
60.60 ISO/TC 158
ISO/TS 14167:2003 [Withdrawn]
Gas analysis -- General quality assurance aspects in the use of calibration gas mixtures - Guidelines
95.99 ISO/TC 158
ISO/DTR 14187 [Under development]
Surface chemical analysis -- Characterization of nanostructured materials
30.99 ISO/TC 201/SC 7
ISO/TR 14187:2011
Surface chemical analysis -- Characterization of nanostructured materials
90.92 ISO/TC 201/SC 7
ISO 14237:2000 [Withdrawn]
Surface chemical analysis -- Secondary-ion mass spectrometry -- Determination of boron atomic concentration in silicon using uniformly doped materials
95.99 ISO/TC 201/SC 6
ISO 14237:2010
Surface chemical analysis -- Secondary-ion mass spectrometry -- Determination of boron atomic concentration in silicon using uniformly doped materials
90.93 ISO/TC 201/SC 6
ISO 14606:2000 [Withdrawn]
Surface chemical analysis -- Sputter depth profiling -- Optimization using layered systems as reference materials
95.99 ISO/TC 201/SC 4
ISO 14606:2015
Surface chemical analysis -- Sputter depth profiling -- Optimization using layered systems as reference materials
60.60 ISO/TC 201/SC 4
ISO 14701:2011 [Withdrawn]
Surface chemical analysis -- X-ray photoelectron spectroscopy -- Measurement of silicon oxide thickness
95.99 ISO/TC 201/SC 7
ISO 14701:2018
Surface chemical analysis -- X-ray photoelectron spectroscopy -- Measurement of silicon oxide thickness
60.60 ISO/TC 201/SC 7
ISO 14706:2000 [Withdrawn]
Surface chemical analysis -- Determination of surface elemental contamination on silicon wafers by total-reflection X-ray fluorescence (TXRF) spectroscopy
95.99 ISO/TC 201
ISO 14706:2014
Surface chemical analysis -- Determination of surface elemental contamination on silicon wafers by total-reflection X-ray fluorescence (TXRF) spectroscopy
60.60 ISO/TC 201
ISO 14707:2000 [Withdrawn]
Surface chemical analysis -- Glow discharge optical emission spectrometry (GD-OES) -- Introduction to use
95.99 ISO/TC 201/SC 8
ISO 14707:2015
Surface chemical analysis -- Glow discharge optical emission spectrometry (GD-OES) -- Introduction to use
60.60 ISO/TC 201/SC 8
ISO 14912:2003
Gas analysis -- Conversion of gas mixture composition data
90.92 ISO/TC 158
60.60 ISO/TC 158
ISO/NP 14912 [Under development]
Gas analysis -- Conversion of gas mixture composition data
10.99 ISO/TC 158
ISO 14975:2000
Surface chemical analysis -- Information formats
90.93 ISO/TC 201/SC 3
ISO 14976:1998
Surface chemical analysis -- Data transfer format
90.93 ISO/TC 201/SC 3
ISO/TS 15338:2009
Surface chemical analysis -- Glow discharge mass spectrometry (GD-MS) -- Introduction to use
90.92 ISO/TC 201/SC 8
ISO/WD TS 15338 [Under development]
Surface chemical analysis -- Glow discharge mass spectrometry -- Operating procedures
20.60 ISO/TC 201/SC 8
ISO 15470:2004 [Withdrawn]
Surface chemical analysis -- X-ray photoelectron spectroscopy -- Description of selected instrumental performance parameters
95.99 ISO/TC 201/SC 7
ISO 15470:2017
Surface chemical analysis -- X-ray photoelectron spectroscopy -- Description of selected instrumental performance parameters
60.60 ISO/TC 201/SC 7
ISO 15471:2004 [Withdrawn]
Surface chemical analysis -- Auger electron spectroscopy -- Description of selected instrumental performance parameters
95.99 ISO/TC 201/SC 7
ISO 15471:2016
Surface chemical analysis -- Auger electron spectroscopy -- Description of selected instrumental performance parameters
60.60 ISO/TC 201/SC 7
ISO 15472:2001 [Withdrawn]
Surface chemical analysis -- X-ray photoelectron spectrometers -- Calibration of energy scales
95.99 ISO/TC 201/SC 7
ISO 15472:2010
Surface chemical analysis -- X-ray photoelectron spectrometers -- Calibration of energy scales
90.93 ISO/TC 201/SC 7
ISO 15796:2005
Gas analysis -- Investigation and treatment of analytical bias
90.20 ISO/TC 158
ISO/TR 15969:2001
Surface chemical analysis -- Depth profiling -- Measurement of sputtered depth
90.93 ISO/TC 201/SC 4
ISO 16129:2012 [Withdrawn]
Surface chemical analysis -- X-ray photoelectron spectroscopy -- Procedures for assessing the day-to-day performance of an X-ray photoelectron spectrometer
95.99 ISO/TC 201/SC 7
ISO 16129:2018
Surface chemical analysis -- X-ray photoelectron spectroscopy -- Procedures for assessing the day-to-day performance of an X-ray photoelectron spectrometer
60.60 ISO/TC 201/SC 7
ISO 16242:2011
Surface chemical analysis -- Recording and reporting data in Auger electron spectroscopy (AES)
90.93 ISO/TC 201/SC 2
ISO 16243:2011
Surface chemical analysis -- Recording and reporting data in X-ray photoelectron spectroscopy (XPS)
90.93 ISO/TC 201/SC 2
ISO/TR 16268:2009
Surface chemical analysis -- Proposed procedure for certifying the retained areic dose in a working reference material produced by ion implantation
60.60 ISO/TC 201/SC 2
ISO 16413:2013
Evaluation of thickness, density and interface width of thin films by X-ray reflectometry -- Instrumental requirements, alignment and positioning, data collection, data analysis and reporting
90.92 ISO/TC 201
ISO/DIS 16413 [Under development]
Evaluation of thickness, density and interface width of thin films by X-ray reflectometry -- Instrumental requirements, alignment and positioning, data collection, data analysis and reporting
40.99 ISO/TC 201
ISO 16531:2013
Surface chemical analysis -- Depth profiling -- Methods for ion beam alignment and the associated measurement of current or current density for depth profiling in AES and XPS
90.92 ISO/TC 201/SC 4
ISO/NP 16531 [Under development]
Surface chemical analysis -- Depth profiling -- Methods for ion beam alignment and the associated measurement of current or current density for depth profiling in AES and XPS
10.99 ISO/TC 201/SC 4
ISO 16664:2004 [Withdrawn]
Gas analysis -- Handling of calibration gases and gas mixtures -- Guidelines
95.99 ISO/TC 158
ISO 16664:2017
Gas analysis -- Handling of calibration gases and gas mixtures -- Guidelines
60.60 ISO/TC 158
ISO 16962:2005 [Withdrawn]
Surface chemical analysis -- Analysis of zinc- and/or aluminium-based metallic coatings by glow-discharge optical-emission spectrometry
95.99 ISO/TC 201/SC 8
ISO 16962:2017
Surface chemical analysis -- Analysis of zinc- and/or aluminium-based metallic coatings by glow-discharge optical-emission spectrometry
60.60 ISO/TC 201/SC 8
ISO 17109:2015
Surface chemical analysis -- Depth profiling -- Method for sputter rate determination in X-ray photoelectron spectroscopy, Auger electron spectroscopy and secondary-ion mass spectrometry sputter depth profiling using single and multi-layer thin films
60.60 ISO/TC 201/SC 4
ISO 17331:2004
Surface chemical analysis -- Chemical methods for the collection of elements from the surface of silicon-wafer working reference materials and their determination by total-reflection X-ray fluorescence (TXRF) spectroscopy
90.60 ISO/TC 201
60.60 ISO/TC 201
ISO 17560:2002 [Withdrawn]
Surface chemical analysis -- Secondary-ion mass spectrometry -- Method for depth profiling of boron in silicon
95.99 ISO/TC 201/SC 6
ISO 17560:2014
Surface chemical analysis -- Secondary-ion mass spectrometry -- Method for depth profiling of boron in silicon
60.60 ISO/TC 201/SC 6
ISO 17862:2013
Surface chemical analysis -- Secondary ion mass spectrometry -- Linearity of intensity scale in single ion counting time-of-flight mass analysers
90.60 ISO/TC 201/SC 6
ISO 17973:2002 [Withdrawn]
Surface chemical analysis -- Medium-resolution Auger electron spectrometers -- Calibration of energy scales for elemental analysis
95.99 ISO/TC 201/SC 7
ISO 17973:2016
Surface chemical analysis -- Medium-resolution Auger electron spectrometers -- Calibration of energy scales for elemental analysis
60.60 ISO/TC 201/SC 7
ISO 17974:2002
Surface chemical analysis -- High-resolution Auger electron spectrometers -- Calibration of energy scales for elemental and chemical-state analysis
90.93 ISO/TC 201/SC 7
ISO 18114:2003
Surface chemical analysis -- Secondary-ion mass spectrometry -- Determination of relative sensitivity factors from ion-implanted reference materials
90.20 ISO/TC 201/SC 6
ISO 18115:2001 [Withdrawn]
Surface chemical analysis -- Vocabulary
95.99 ISO/TC 201/SC 1
95.99 ISO/TC 201/SC 1
95.99 ISO/TC 201/SC 1
ISO 18115-1:2010 [Withdrawn]
Surface chemical analysis -- Vocabulary -- Part 1: General terms and terms used in spectroscopy
95.99 ISO/TC 201/SC 1
ISO 18115-1:2013
Surface chemical analysis -- Vocabulary -- Part 1: General terms and terms used in spectroscopy
90.93 ISO/TC 201/SC 1
ISO 18115-2:2010 [Withdrawn]
Surface chemical analysis -- Vocabulary -- Part 2: Terms used in scanning-probe microscopy
95.99 ISO/TC 201/SC 1
ISO 18115-2:2013
Surface chemical analysis -- Vocabulary -- Part 2: Terms used in scanning-probe microscopy
90.60 ISO/TC 201/SC 1
ISO 18116:2005
Surface chemical analysis -- Guidelines for preparation and mounting of specimens for analysis
90.92 ISO/TC 201/SC 2
ISO 18117:2009
Surface chemical analysis -- Handling of specimens prior to analysis
90.92 ISO/TC 201/SC 2
ISO 18118:2004 [Withdrawn]
Surface chemical analysis -- Auger electron spectroscopy and X-ray photoelectron spectroscopy -- Guide to the use of experimentally determined relative sensitivity factors for the quantitative analysis of homogeneous materials
95.99 ISO/TC 201/SC 7
ISO 18118:2015
Surface chemical analysis -- Auger electron spectroscopy and X-ray photoelectron spectroscopy -- Guide to the use of experimentally determined relative sensitivity factors for the quantitative analysis of homogeneous materials
60.60 ISO/TC 201/SC 7
ISO 18337:2015
Surface chemical analysis -- Surface characterization -- Measurement of the lateral resolution of a confocal fluorescence microscope
60.60 ISO/TC 201
ISO/DTR 18392 [Under development]
Surface chemical analysis -- X-ray photoelectron spectroscopy -- Procedures for determining backgrounds
30.60 ISO/TC 201/SC 7
ISO/TR 18392:2005
Surface chemical analysis -- X-ray photoelectron spectroscopy -- Procedures for determining backgrounds
90.92 ISO/TC 201/SC 7
ISO/TR 18394:2006 [Withdrawn]
Surface chemical analysis -- Auger electron spectroscopy -- Derivation of chemical information
95.99 ISO/TC 201/SC 7
ISO/TR 18394:2016
Surface chemical analysis -- Auger electron spectroscopy -- Derivation of chemical information
60.60 ISO/TC 201/SC 7
ISO/TS 18507:2015
Surface chemical analysis -- Use of Total Reflection X-ray Fluorescence spectroscopy in biological and environmental analysis
90.60 ISO/TC 201
ISO 18516:2006 [Withdrawn]
Surface chemical analysis -- Auger electron spectroscopy and X-ray photoelectron spectroscopy -- Determination of lateral resolution
95.99 ISO/TC 201/SC 2
ISO 18516:2019
Surface chemical analysis -- Determination of lateral resolution and sharpness in beam based methods with a range from nanometres to micrometres
60.60 ISO/TC 201/SC 2
ISO 18554:2016
Surface chemical analysis -- Electron spectroscopies -- Procedures for identifying, estimating and correcting for unintended degradation by X-rays in a material undergoing analysis by X-ray photoelectron spectroscopy
60.60 ISO/TC 201/SC 7
ISO 19229:2015
Gas analysis -- Purity analysis and the treatment of purity data
90.92 ISO/TC 158
ISO/PRF 19229 [Under development]
Gas analysis -- Purity analysis and the treatment of purity data
50.00 ISO/TC 158
ISO/CD 19230 [Under development]
Gas analysis -- Sampling guidelines
30.20 ISO/TC 158
ISO 19318:2004
Surface chemical analysis -- X-ray photoelectron spectroscopy -- Reporting of methods used for charge control and charge correction
90.20 ISO/TC 201/SC 7
ISO/TR 19319:2003 [Withdrawn]
Surface chemical analysis -- Auger electron spectroscopy and X-ray photoelectron spectroscopy -- Determination of lateral resolution, analysis area, and sample area viewed by the analyser
95.99 ISO/TC 201/SC 2
ISO/TR 19319:2013
Surface chemical analysis -- Fundamental approaches to determination of lateral resolution and sharpness in beam-based methods
60.60 ISO/TC 201/SC 2
ISO 19668:2017
Surface chemical analysis -- X-ray photoelectron spectroscopy -- Estimating and reporting detection limits for elements in homogeneous materials
60.60 ISO/TC 201/SC 7
ISO/TR 19693:2018
Surface chemical analysis -- Characterization of functional glass substrates for biosensing applications
60.60 ISO/TC 201
ISO 19830:2015
Surface chemical analysis -- Electron spectroscopies -- Minimum reporting requirements for peak fitting in X-ray photoelectron spectroscopy
60.60 ISO/TC 201/SC 7
ISO 20289:2018
Surface chemical analysis -- Total reflection X-ray fluorescence analysis of water
60.60 ISO/TC 201/SC 10
ISO 20341:2003
Surface chemical analysis -- Secondary-ion mass spectrometry -- Method for estimating depth resolution parameters with multiple delta-layer reference materials
90.20 ISO/TC 201/SC 6
ISO 20411:2018
Surface chemical analysis -- Secondary ion mass spectrometry -- Correction method for saturated intensity in single ion counting dynamic secondary ion mass spectrometry
60.60 ISO/TC 201/SC 6
ISO/PRF 20579-1 [Under development]
Surface chemical analysis -- Guidelines to sample handling, preparation and mounting -- Part 1: Guidelines to handling of specimens prior to analysis
50.00 ISO/TC 201/SC 2
ISO/PRF 20579-2 [Under development]
Surface chemical analysis -- Guidelines to sample handling, preparation and mounting -- Part 2: Guidelines to preparation and mounting of specimens prior to analysis
50.00 ISO/TC 201/SC 2
ISO/DIS 20579-3 [Under development]
Surface chemical analysis -- Sample handling, preparation and mounting -- Part 3: Biomaterials
40.60 ISO/TC 201/SC 2
ISO 20579-4:2018
Surface chemical analysis -- Guidelines to sample handling, preparation and mounting -- Part 4: Reporting information related to the history, preparation, handling and mounting of nano-objects prior to surface analysis
60.60 ISO/TC 201/SC 2
ISO 20903:2006 [Withdrawn]
Surface chemical analysis -- Auger electron spectroscopy and X-ray photoelectron spectroscopy -- Methods used to determine peak intensities and information required when reporting results
95.99 ISO/TC 201/SC 7
ISO 20903:2011 [Withdrawn]
Surface chemical analysis -- Auger electron spectroscopy and X-ray photoelectron spectroscopy -- Methods used to determine peak intensities and information required when reporting results
95.99 ISO/TC 201/SC 7
ISO 20903:2019
Surface chemical analysis -- Auger electron spectroscopy and X-ray photoelectron spectroscopy -- Methods used to determine peak intensities and information required when reporting results
60.60 ISO/TC 201/SC 7
ISO 21079-1:2008
Chemical analysis of refractories containing alumina, zirconia and silica -- Refractories containing 5 percent to 45 percent of ZrO2 (alternative to the X-ray fluorescence method) -- Part 1: Apparatus, reagents and dissolution
90.93 ISO/TC 33
ISO 21079-2:2008
Chemical analysis of refractories containing alumina, zirconia, and silica -- Refractories containing 5 percent to 45 percent of ZrO2 (alternative to the X-ray fluorescence method) -- Part 2: Wet chemical analysis
90.93 ISO/TC 33
ISO 21079-3:2008
Chemical analysis of refractories containing alumina, zirconia, and silica -- Refractories containing 5 percent to 45 percent of ZrO2 (alternative to the X-ray fluorescence method) -- Part 3: Flame atomic absorption spectrophotometry (FAAS) and inductively coupled plasma emission spectrometry (ICP -AES)
90.93 ISO/TC 33
ISO/DIS 21222 [Under development]
Surface chemical analysis -- Scanning probe microscopy -- Procedure for the determination of elastic moduli for compliant materials using atomic force microscope and the two-point JKR method
40.20 ISO/TC 201/SC 9
ISO 21270:2004
Surface chemical analysis -- X-ray photoelectron and Auger electron spectrometers -- Linearity of intensity scale
90.93 ISO/TC 201/SC 7
ISO 22048:2004
Surface chemical analysis -- Information format for static secondary-ion mass spectrometry
90.93 ISO/TC 201/SC 3
ISO/TR 22335:2007
Surface chemical analysis -- Depth profiling -- Measurement of sputtering rate: mesh-replica method using a mechanical stylus profilometer
90.93 ISO/TC 201/SC 4
ISO 22415 [Under development]
Surface chemical analysis -- Secondary ion mass spectrometry -- Method for determining yield volume in argon cluster sputter depth profiling of organic materials
60.00 ISO/TC 201/SC 6
ISO/CD 22581 [Under development]
Surface Chemical Analysis by XPS - Data Management and Treatment - Rules for Identification of and Correction for the Presence of Surface Contamination by Carbon-containing Compound
30.99 ISO/TC 201/SC 3
ISO 23812:2009
Surface chemical analysis -- Secondary-ion mass spectrometry -- Method for depth calibration for silicon using multiple delta-layer reference materials
90.93 ISO/TC 201/SC 6
ISO 23830:2008
Surface chemical analysis -- Secondary-ion mass spectrometry -- Repeatability and constancy of the relative-intensity scale in static secondary-ion mass spectrometry
90.93 ISO/TC 201/SC 6
ISO 24236:2005
Surface chemical analysis -- Auger electron spectroscopy -- Repeatability and constancy of intensity scale
90.93 ISO/TC 201/SC 7
ISO 24237:2005
Surface chemical analysis -- X-ray photoelectron spectroscopy -- Repeatability and constancy of intensity scale
90.93 ISO/TC 201/SC 7
ISO/PRF TS 25138 [Under development]
Surface chemical analysis -- Analysis of metal oxide films by glow-discharge optical-emission spectrometry
50.00 ISO/TC 201/SC 8
ISO/TS 25138:2010
Surface chemical analysis -- Analysis of metal oxide films by glow-discharge optical-emission spectrometry
90.92 ISO/TC 201/SC 8
ISO 27911:2011
Surface chemical analysis -- Scanning-probe microscopy -- Definition and calibration of the lateral resolution of a near-field optical microscope
90.93 ISO/TC 201/SC 9
ISO 28600:2011
Surface chemical analysis -- Data transfer format for scanning-probe microscopy
90.93 ISO/TC 201/SC 3
ISO/TS 29041:2008
Gas mixtures -- Gravimetric preparation -- Mastering correlations in composition
90.60 ISO/TC 158
60.60 ISO/TC 158
ISO 29081:2010
Surface chemical analysis -- Auger electron spectroscopy -- Reporting of methods used for charge control and charge correction
90.93 ISO/TC 201/SC 7

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