TC 201
Surface chemical analysis
- Secretariat: JISC
- Secretary:
- Chairperson: Dr Shingo Ichimura vacant until end 2013
- Creation date: 1991
- Work programme
(drafts and new work items of TC 201)
Scope:
Standardization in the field of surface chemical analysis. Surface chemical analysis includes analytical techniques in which beams of electrons, ions, neutral atoms or molecules, or photons are incident on the specimen material and scattered or emitted electrons, ions, neutral atoms or molecules, or photons are detected. It also includes techniques in which probes are scanned over the surface and surface-related signals are detected.
Excluded:
- Scanning electron microscopy which is within the scope of ISO/TC 202.
Note:
With current techniques of surface chemical analysis, analytical information is obtained for regions close to a surface (generally within 20 nm) and analytical information-versus-depth data are obtained with surface analytical techniques over greater depths.
| Total number of published ISO standards related to the TC and its SCs: | 38 |
| Number of published ISO standards under the direct responsibility of TC 201: | 2 |
| Participating countries: | 10 |
| Observing countries: | 18 |
ISO committees in liaison:
Organizations in liaison:
Subcommittees/Working Groups:
| Subcommittee/Working Group | Title |
|---|---|
| TC 201/WG 2 |
Total reflection X-ray fluorescence spectroscopy The convener can be reached through the secretariat |
| TC 201/WG 3 |
X-ray reflectivity The convener can be reached through the secretariat |
| TC 201/SC 1 | Terminology |
| TC 201/SC 2 | General procedures |
| TC 201/SC 3 | Data management and treatment |
| TC 201/SC 4 | Depth profiling |
| TC 201/SC 5 | Auger electron spectroscopy |
| TC 201/SC 6 | Secondary ion mass spectrometry |
| TC 201/SC 7 | X-ray photoelectron spectroscopy |
| TC 201/SC 8 | Glow discharge spectroscopy |
| TC 201/SC 9 | Scanning probe microscopy |
Meeting calendar
* Information definite but meeting not yet formally convened
** Provisional
| Month | Location | |||
|---|---|---|---|---|
| October 2010 | 20-28 | Beijing (China) | ** | TC 201 |


