Items to be displayed:
| Standard and/or project | Stage | ICS | TC |
|---|---|---|---|
| ISO/CD 11775 Surface chemical analysis -- Scanning-probe microscopy -- Determination of cantilever normal spring constants | 30.99 | 71.040.40 | ISO/TC 201/SC 9 |
| ISO/DIS 11952 Surface chemical analysis -- Scanning-probe microscopy -- Determination of geometric quantities using SPM: Calibration of measuring systems | 40.99 | 71.040.40 | ISO/TC 201/SC 9 |
| ISO/DIS 13083 Surface chemical analysis - Scanning Probe Microscopy- Standards on the definition and calibration of spatial resolution of Scanning Spreading Resistance Microscopy and Scanning Capacitance Microscopy | 40.20 | 71.040.40 | ISO/TC 201/SC 9 |
| ISO/DIS 13095 Surface Chemical Analysis -- Atomic force microscopy -- Procedure for in situ characterization of AFM probe shank profile used for nanostructure measurement | 40.00 | 71.040.40 | ISO/TC 201/SC 9 |
| ISO/WD TR 13096 Surface chemical analysis -- Scanning-probe microscopy -- Guidelines for the description of AFM probe properties | 20.20 | 71.040.40 | ISO/TC 201/SC 9 |
| ISO/PRF 13424 Surface chemical analysis -- X-ray photoelectron spectroscopy -- Reporting of results of thin-film analysis | 50.00 | 71.040.40 | ISO/TC 201/SC 7 |
| ISO/DIS 14606 Surface chemical analysis -- Sputter depth profiling -- Optimization using layered systems as reference materials | 40.99 | 71.040.40 | ISO/TC 201/SC 4 |
| ISO/DIS 14706 Surface chemical analysis -- Determination of surface elemental contamination on silicon wafers by total-reflection X-ray fluorescence (TXRF) spectroscopy | 40.00 | 71.040.40 | ISO/TC 201 |
| ISO/WD 14707 Surface chemical analysis -- Glow discharge optical emission spectrometry (GD-OES) -- Introduction to use | 20.20 | 71.040.40 | ISO/TC 201/SC 8 |
| ISO/WD 17109 Surface chemical analysis -- Depth profiling -- A method for sputter rate determination in X-ray photoelectron spectroscopy, Auger electron spectroscopy and secondary-ion mass spectrometry sputter depth profiling using multi-layer thin films | 20.60 | 71.040.40 | ISO/TC 201/SC 4 |
| ISO/DIS 17862 Surface chemical analysis - Secondary ion mass spectrometry -- Linearity of intensity scale in single ion counting time-of-flight mass analysers | 40.00 | 71.040.40 | ISO/TC 201/SC 6 |
| ISO/WD 17980 Surface chemical analysis -- Surface characterization methods to measure surface properties of biomaterials and corresponding biointeractions | 20.60 | 71.040.40 | ISO/TC 201 |
| ISO/FDIS 18115-1 Surface chemical analysis -- Vocabulary -- Part 1: General terms and terms used in spectroscopy | 50.00 | 01.040.71 71.040.40 | ISO/TC 201/SC 1 |
| ISO/FDIS 18115-2 Surface chemical analysis -- Vocabulary -- Part 2: Terms used in scanning-probe microscopy | 50.00 | 01.040.71 71.040.40 | ISO/TC 201/SC 1 |
| ISO/WD 18337 Surface chemical analysis -- Measurement of lateral resolution of confocal fluorescence microscope | 20.20 | 71.040.40 | ISO/TC 201 |
| ISO/WD TS 18507 Surface Chemical Analysis - Technical Specification for the use of Total Reflection X-ray Fluorescence spectroscopy in biological and environmental analysis | 20.20 | 71.040.40 | ISO/TC 201 |
| ISO/AWI 18554 Procedures for identifying, estimating and correcting for unintended degradation in a material undergoing analysis by X-ray photoelectron spectroscopy | 20.00 | ISO/TC 201/SC 7 |
